The EMS R T is a large chamber, rotary-pumped coating system ideally suited for sputtering a single large diameter specimen up to 8″/ mm (e.g. a wafer). The EMST S Plus is a high resolution sputter coater for oxidizing and non- oxidizing The EMS T Plus product line is a compact turbomolecular- pumped. EMS T Turbo-Pumped Sputter Coater/Carbon Coater. The EMST is a compact turbomolecular- pumped coating system suitable for SEM,. TEM and many.
Intelligent system logic automatically detects which insert is in place and displays the appropriate operating settings and controls for that process. Target to stage height is variable between 10 mm and 53 mm for the standard stage. E Automatic Sputter Coater.
Pioneering annular head sputter coater developed by Polaron. Hydraulically-formed bellows stainless-steel backing line. The platform has six specimen stub positions for 15 mm, trubo mm, 6. Automatic detection of the head type when changed. The EMS T D Plus uses low temperature enhanced-plasma magnetrons optimized sputtet the turbomolecular pump pressures, combined with low current and deposition control, which ensures your substrate is protected and uniformly coated.
NanoSurface Cytostretcher Cell Stretcher. Cannot be used when the coater is operated in ‘single target’ mode.
However, sputfer is not suitable for electron microscopy applications because it can heat the sample and result in damage when the plasma interacts with the sample.
Designed for sputtering non-oxidising metals – gold Au fitted as standard. All are easy-change, drop-in style no screws and are height adjustable except for the rotary planetary stage. For many evaporative processes, tungsten filaments supplied with the system are used. A range of typical sputtering and evaporation profiles are pre-installed. The EMS T T Plus uses low temperature enhanced-plasma magnetrons optimized for the turbomolecular pump pressures, combined with low current and deposition control, which ensures your sample is protected and uniformly coated.
However, this is not suitable for electron microscopy applications because it will heat the sample and can result in damage when the plasma interacts with the sample. Sputter Coaters and Carbon Coaters Sputter coaters and carbon coaters.
QT Plus – turbomolecular pumped coater | Quorum Technologies
For carbon supplies, see: Allows multiple users to input and store coating recipes, with a new feature to sort recipes per user according to recent use. For convenience a number of typical sputtering and carbon coating profiles are already stored but also allows the user to create their own. Consists of high resolution turbomolecular pumped capacitive touch-screen controled sputter coater and carbon evaporator with status LED indicatorincluding quick release sputter insert and one TK 57mm diameter x 0.
Variable tilt angle, rotary planetary specimen stage, 50mm diameter rotational speed rpm. Allows multiple users to input and store coating recipes, with a new feature to sort recipes per user according to recent use. Send me a QT quote. Height can be pre-set. Allows multiple users to input and store coating recipes. Manual carbon rod shaper for 3. Consists of a built in chamber mounted quartz crystal oscillator includes crystal.
High vacuum turbo pumping allows sputtering of a wide range of oxidizing and non-oxidizing metals for thin film and electron microscopy applications. Rotation speed is variable between preset limits. The vacuum shutdown option enhances vacuum performance by allowing the chamber vacuum to be maintained when the coater is not in use.
For zputter stages, see Ordering Information. Intuitive software allows the most inexperienced or occasional operator to rapidly enter and store their own process data. Trbo prompts user to confirm target material and it then automatically selects appropriate parameters for that material. Users can rapidly change the chamber, if necessary, to avoid cross contamination of sensitive samples.
Tilt and height can be pre-set. The deposition heads can be swapped in seconds and the intelligent system logic automatically recognizes which head is in place and displays the appropriate operating settings. For single metal applications one target can be selected. Complies with the current legislation CE Certification and ensures efficient use of power, resulting in reduced running costs.
It is fitted with gold Au and chromium Cr sputter targets as standard. View Cart Request a Catalog. It is provided with a key to release the knob after activation. Other stages available on request.
As an accessory, a 6″ wafer stage is available, which is a flat adjustable stage capable of accepting 6″ or mm wafers.